半导体
Semiconductors
Covering material properties, thermo-mechanical reliability, growth and manufacturing, ferroelectric materials, and advanced integration and packaging, we study electronic structure, defects and doping, thin-film growth, thermal stress and interface reliability.
Material Properties

Electron–Phonon Transport
Band structure, phonon dispersion, electron–phonon coupling, mobility, scattering mechanisms, Brillouin-zone high-symmetry points
View Details
Defects and Doping
Defect formation energy, charge states, dopant levels, DOS/PDOS, local relaxation, compensation mechanisms
View Details
Heterointerfaces
Interface structure, band alignment, charge transfer, interface dipole, strain mismatch, interface states
View DetailsThermo-mechanical Reliability

Interfacial Heat Transport
Interfacial thermal conductance, phonon transmission, thermal boundary resistance, spectral matching, interface scattering, temperature gradient
View Details
Thermal Stress and Deformation
Thermal-expansion mismatch, stress distribution, strain field, warpage, delamination risk, thermal cycling
View DetailsGrowth and Manufacturing
Ferroelectric Materials

Vacancies and Ferroelectric Mechanisms
Oxygen vacancies, defect dipoles, polarization stability, switching barriers, local distortion, leakage correlation
View Details
Ferroelectric Domains and Polarization
Domain structure, polarization orientation, domain-wall energy, switching paths, remnant polarization, electric-field response
View Details
Ferroelectric Phase Formation
Phase stability, transformation pathways, lattice distortion, strain-induced phases, free-energy comparison, phase-boundary structure
View DetailsAdvanced Integration and Packaging

Electromigration
Atomic migration, void nucleation, current density, temperature coupling, lifetime assessment, interconnect failure
View Details
Multi-chip Integration
Chip stacking, interconnect topology, signal integrity, power distribution, thermal coupling, system-level co-design
View Details
Hybrid Bonding
Plasma activation, room-temperature dielectric bonding, annealing Cu join-up, Cu/dielectric interface, bond strength, void control
View Details
Thermal Management
Hotspot distribution, heat-conduction paths, package thermal resistance, TIM materials, temperature uniformity, thermal reliability
View Details

